Allee

David R. Allee received his BS in electrical engineering from the University of Cincinnati in 1984 and MS and PhD in electrical engineering from Stanford University in 1986 and 1990, respectively. He was a post-doctoral fellow at Cambridge University in 1990 and 1991. While at Stanford University, and as a Research Associate at Cambridge University, he fabricated scaled field effect transistors with ultra-short gate lengths using custom e-beam lithography. He also invented several ultra-high resolution lithography techniques including direct e-beam irradiation of SiO₂, and nanometer scale patterning of various organic and inorganic films with scanning tunneling lithography (ASU). Since joining Arizona State University, his primary focus has been on mixed signal integrated circuit design. As a founding member of the NSF Center for Low Power Electronics and the Whitaker Center for Neuromechanical Control, he has designed several custom analog to digital converters and telemetry ICs. David is currently Director of Research for Backplane Electronics for the Flexible Display Center at Arizona State University, and he is investigating a variety of flexible electronics applications. He has been a regular consultant with several semiconductor industries on low voltage, low power mixed signal circuit design. He has co-authored over 75 archival scientific publications.